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Energy Efficient 7tons/H Ultrapure Water Treantment Plant For Wafer Manufacturing
| Place of Origin | Guangdong,China |
|---|---|
| Brand Name | HongJie |
| Certification | ISO 14001,ISO 9001,CE,EPA |
| Minimum Order Quantity | >=1sets |
| Price | US$20500~US$21000 |
| Packaging Details | export standard wooden case |
| Delivery Time | 1-7working days(depand on raw materials stocking) |
| Payment Terms | L/C,D/P,T/T,Western Union |
| Supply Ability | >300sets/month |
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xProduct Details
| Flow Rate | 7m³/h(Customizable) | Resistivity (25°C) | ≈18.24 MΩ·cm |
|---|---|---|---|
| Core Process | Double-pass Reverse Osmosis + EDI | Core Components | RO Membrane Modules, EDI Units |
| Operation Mode | Fully Automated | Product Features | Stable Water Quality Output, Low Operational Costs |
| After-Sales Service | 24/7 Technical Support, 2-Year Maintenance | TOC | < 0.5 Ppb |
| Highlight | 7tons/h Ultrapure Water Treantment,Energy Efficient Ultrapure Water Treantment,Energy Efficient pure water treatment plant |
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Product Description
I.Overview
Ultra-pure water (UPW) is a key medium for maintaining process purity in wafer manufacturing. Its quality directly affects chip yield and performance, making it the “invisible lifeline” of wafer manufacturing.
II.Process
Raw Water → Raw Water Pressure Pump → Multimedia Filter → Activated Carbon Filter → Water Softener → Precision Filter → Primary RO → pH Adjustment → Intermediate Water Tank → Secondary RO → Intermediate Water Tank → Intermediate Water Pump → EDI System → Purified Water Tank → Pure Water Pump → UV Sterilizer → Microporous Filter →Pasteurization → Water Point
III.Process Features
Zero chemical pollution throughout the entire process (EDI replaces acid-base regeneration)
Concentrated water recycling, water savings > 30%
Dual UV synergistic control of TOC/microbes
Temperature split to suit different process requirements
IV.Parameters
| Parameter | Chip Grade Requirement (≤7nm) |
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| Resistivity (25°C) | ≈18.24 MΩ·cm | ||||
| TOC | < 0.5 ppb | ||||
| Particles (> 0.05μm) | < 0.1 particle/ml | ||||
| Metal Ions | < 0.1 ppt | ||||
| Dissolved Oxygen (DO) | < 1 ppb | ||||
| Bacteria | ≤0.01 CFU/ml |
V.Main Applications
Wafer Cleaning
Chemical Mechanical Polishing (CMP)
Etching and Film Deposition
Cooling and Functional Water
VI.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )
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