products details

Created with Pixso. Home Created with Pixso. Products Created with Pixso.
Ultrapure Water Equipment
Created with Pixso.

Energy Efficient 7tons/H Ultrapure Water Treantment Plant For Wafer Manufacturing

Energy Efficient 7tons/H Ultrapure Water Treantment Plant For Wafer Manufacturing

Brand Name: HongJie
MOQ: >=1sets
Price: US$20500~US$21000
Payment Terms: L/C,D/P,T/T,Western Union
Supply Ability: >300sets/month
Detail Information
Place of Origin:
Guangdong,China
Certification:
ISO 14001,ISO 9001,CE,EPA
Flow Rate:
7m³/h(Customizable)
Resistivity (25°C):
≈18.24 MΩ·cm
Core Process:
Double-pass Reverse Osmosis + EDI
Core Components:
RO Membrane Modules, EDI Units
Operation Mode:
Fully Automated
Product Features:
Stable Water Quality Output, Low Operational Costs
After-Sales Service:
24/7 Technical Support, 2-Year Maintenance
TOC:
< 0.5 Ppb
Packaging Details:
export standard wooden case
Highlight:

7tons/h Ultrapure Water Treantment

,

Energy Efficient Ultrapure Water Treantment

,

Energy Efficient pure water treatment plant

Product Description

I.Overview
Ultra-pure water (UPW) is a key medium for maintaining process purity in wafer manufacturing. Its quality directly affects chip yield and performance, making it the “invisible lifeline” of wafer manufacturing.

 

II.Process
Raw Water → Raw Water Pressure Pump → Multimedia Filter → Activated Carbon Filter → Water Softener → Precision Filter → Primary RO → pH Adjustment → Intermediate Water Tank → Secondary RO → Intermediate Water Tank → Intermediate Water Pump → EDI System → Purified Water Tank → Pure Water Pump → UV Sterilizer → Microporous Filter →Pasteurization → Water Point

 

III.Process Features
Zero chemical pollution throughout the entire process (EDI replaces acid-base regeneration)
Concentrated water recycling, water savings > 30%
Dual UV synergistic control of TOC/microbes
Temperature split to suit different process requirements

 

IV.Parameters

Parameter Chip Grade Requirement
 (≤7nm)
Resistivity (25°C) ≈18.24 MΩ·cm
TOC < 0.5 ppb
Particles (> 0.05μm) < 0.1 particle/ml
Metal Ions < 0.1 ppt
Dissolved Oxygen (DO) < 1 ppb
Bacteria ≤0.01 CFU/ml

 

V.Main Applications
Wafer Cleaning
Chemical Mechanical Polishing (CMP)
Etching and Film Deposition
Cooling and Functional Water

 

VI.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )