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Ultrapure Water Equipment
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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

Brand Name: HongJie
Model Number: HJ-UPWSe50T
MOQ: >=1sets
Price: US$44000~US$44500
Payment Terms: L/C,D/P,T/T,Western Union
Supply Ability: >300sets/month
Detail Information
Place of Origin:
Shenzhen,China
Certification:
ISO 14001,ISO 9001,CE,EPA
Flow Rate:
50m³/H (Customizable)
Water Quality:
Resistivity≥18.18 MΩ·cm (25°C)
Core Process:
Reverse Osmosis + EDI + Polishing Resin
Key Components:
RO Membrane Modules, EDI Units
Electricity Supply:
380V/220V
After-Sales Service:
2-Year Warranty
Operation Mode:
Fully Automatic
Product Features:
Stable Water Quality,Low Operation Cost,Reliable Performance
TOC:
<0.5 Ppb (Immersion Fluid Requirement <1 Ppt)
Particulate Matter:
>0.05μm Particles <1 Per ML
Packaging Details:
export standard wooden case
Highlight:

Ultra Pure Water Equipment For Lithography

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20T/H Ultra Pure Water Equipment

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Custom Made ultra pure water machine

Product Description

I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.

 

II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank

 

III.Parameters

Parameter Required Value
Resistivity ≥18.18 MΩ·cm (25°C)
Total Organic Carbon (TOC) <0.5 ppb (Immersion fluid requirement <1 ppt)
Particulate Matter >0.05μm particles <1 per mL
Dissolved Oxygen (DO) <5 ppb
Bacterial Content <0.01 CFU/mL
Silicon Dioxide (SiO₂) <1 ppb
Boron/Sodium Ions <10 ppt

 

IV.Application Scenarios
Wafer Cleaning
Post-Development Washing
Dilution and Preparation of Photoresist/Chemicals
Equipment and Component Cleaning

 

V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )