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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
| Place of Origin | Shenzhen,China |
|---|---|
| Brand Name | HongJie |
| Certification | ISO 14001,ISO 9001,CE,EPA |
| Model Number | HJ-UPWSe50T |
| Minimum Order Quantity | >=1sets |
| Price | US$44000~US$44500 |
| Packaging Details | export standard wooden case |
| Delivery Time | 1-7working days(depand on raw materials stocking) |
| Payment Terms | L/C,D/P,T/T,Western Union |
| Supply Ability | >300sets/month |
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xProduct Details
| Flow Rate | 50m³/H (Customizable) | Water Quality | Resistivity≥18.18 MΩ·cm (25°C) |
|---|---|---|---|
| Core Process | Reverse Osmosis + EDI + Polishing Resin | Key Components | RO Membrane Modules, EDI Units |
| Electricity Supply | 380V/220V | After-Sales Service | 2-Year Warranty |
| Operation Mode | Fully Automatic | Product Features | Stable Water Quality,Low Operation Cost,Reliable Performance |
| TOC | <0.5 Ppb (Immersion Fluid Requirement <1 Ppt) | Particulate Matter | >0.05μm Particles <1 Per ML |
| Highlight | Ultra Pure Water Equipment For Lithography,20T/H Ultra Pure Water Equipment,Custom Made ultra pure water machine |
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Product Description
I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.
II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank
III.Parameters
| Parameter | Required Value |
| Resistivity | ≥18.18 MΩ·cm (25°C) |
| Total Organic Carbon (TOC) | <0.5 ppb (Immersion fluid requirement <1 ppt) |
| Particulate Matter | >0.05μm particles <1 per mL |
| Dissolved Oxygen (DO) | <5 ppb |
| Bacterial Content | <0.01 CFU/mL |
| Silicon Dioxide (SiO₂) | <1 ppb |
| Boron/Sodium Ions | <10 ppt |
IV.Application Scenarios
Wafer Cleaning
Post-Development Washing
Dilution and Preparation of Photoresist/Chemicals
Equipment and Component Cleaning
V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )
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