Ultrapure Water Treatment Equipment 8000gph For Chip Industry With RO Machine + EDI Unit

Water Treatment Equipment Suppliers 8000gph Ultrapure Water For Chip Industry With RO Machine + EDI Unit

I.Overview
In chip (integrated circuit) manufacturing, ultrapure water (UPW) is an indispensable key auxiliary material, often referred to as the “lifeblood of the semiconductor industry.” Its core function is to remove trace impurities (such as particles, metal ions, and organic compounds) from the surface of wafers through high-precision cleaning, dilution, or participation in process reactions, directly impacting chip yield, performance, and reliability.

II.Process
1.Mainstream process (applicable to 14nm and above process nodes):
Raw Water → Multi-media Filtration → Activated Carbon → Ultrafiltration (UF) → Primary RO → Secondary RO → EDI → UV (185+254 nm) → Degasification → Polishing Mixed Bed → Final Ultrafiltration → Point of Use (POU)

2.Advanced process (suitable for 7nm and below advanced processes) :
Raw water → Ultrafiltration → Double-stage RO → Continuous Electro-deionization (CEDI) → Ultraviolet (185 nm) → Membrane Degassing → Nuclear-grade Polishing Mixed Bed → 0.05μm Final Filtration → Recirculation Distribution System

III.Parameters

IV.Core Application Scenarios
Wafer Cleaning: Removes micro-contaminants to ensure device performance (physical rinsing, cleaning with chemical reagents)
Process Fluid Preparation: Used as a diluent or solvent (photoresist dilution, etching fluid/developing fluid preparation)
Equipment and Environment Cleaning: Prevents cross-contamination (process equipment cleaning, clean room environment maintenance)